Circular Double-Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition-Reference-Cited by-同舟云学术

Circular Double-Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition

Published:2018-04-20 Issue:16 Volume:5 Page:1800054
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Wan Zhixin¹,Lee Ha Jin¹,Kim Hyun Gu²,Jo Gyeong Cheon³,Park Woon Ik⁴,Ryu Seung Wook⁵,Lee Han-Bo-Ram²,Kwon Se-Hun¹

Affiliation:

1. School of Materials Science and Engineering; Global Frontier R&D Center for Hybrid Interface Materials; Institute of Materials Technology; Pusan National University; Busan 46241 South Korea

2. Department of Materials Science and Engineering; Innovation Center for Chemical Engineering; Incheon National University; Incheon 22012 South Korea

3. Department of Chemistry; Korea Advanced Institute of Science and Technology (KAIST); Daejeon 305701 South Korea

4. Electronic Convergence Materials Division; Korea Institute of Ceramic Engineering and Technology (KICET); 101 Soho-ro, Jinju 52851 Republic of Korea

5. SK Hynix; 2091 Gyeongchung-Daero Bubal-rub Icheon-si Gyeonggi-do Incheon 17336 South Korea

Funder

Global Frontier Hybrid Interface Materials

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Ministry of Education

Korean government

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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