In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition-Reference-Cited by-同舟云学术

In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition

Published:2018-10-23 Issue:24 Volume:5 Page:1800957
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Motamedi Pouyan¹²^ORCID,Bosnick Ken¹,Cadien Ken³,Hogan James D.²

Affiliation:

1. Nanotechnology Research Centre; National Research Council Canada; 11421 Saskatchewan Dr. Edmonton AB T6G 2R3 Canada

2. Department of Mechanical Engineering; University of Alberta; 9211 116 St. Edmonton AB T6G 1R1 Canada

3. Department of Chemical and Materials Engineering; University of Alberta; 9211 116 St. Edmonton AB T6G 1R1 Canada

Funder

National Research Council Canada

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201800957/fullpdf

Reference42 articles.

1. Low temperature thin films for next-generation microelectronics (invited)

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5. Current Approach in Surface Plasmons for Thin Film and Wire Array Solar Cell Applications

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