Phonon characteristics of Si‐doped InAs grown by gas‐source molecular beam epitaxy

Author:

Talwar Devki N.12ORCID,Lin Hao‐Hsiung3,Feng Zhe Chuan4

Affiliation:

1. Department of PhysicsUniversity of North Florida Jacksonville Florida USA

2. Department of PhysicsIndiana University of Pennsylvania Indiana Pennsylvania USA

3. Graduate Institute of Electronics Engineering and Department of Electrical EngineeringNational Taiwan University Taipei Taiwan, R.O.C.

4. Laboratory of Optoelectronic Materials and Detection Technology, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and TechnologyGuangxi University Nanning China

Funder

Ministry of Science and Technology, Taiwan

Publisher

Wiley

Subject

Spectroscopy,General Materials Science

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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2. Recent advances in linear and nonlinear Raman spectroscopy. Part XIV;Journal of Raman Spectroscopy;2020-11-30

3. Anisotropic optical phonons in MOCVD grown Si-doped GaN/Sapphire epilayers;Materials Science and Engineering: B;2020-10

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