Affiliation:
1. Institute for Building Materials ETH Zürich Zürich 8093 Switzerland
2. IMDEA Materials Institute C/Eric Kandel 2, Madrid Getafe E‐28906 Spain
3. Institute for Theoretical Physics ETH Zürich Zürich 8093 Switzerland
4. Institute for Theoretical Physics Philosophenweg 16 69120 Heidelberg Germany
Abstract
AbstractUnder high power UV irradiation, radicals can be generated from double bonds through photodissociation, H‐abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high‐power sunlight‐simulated UV‐induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high‐power sunlight‐simulated UV‐induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real‐world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology.