Adaptive control of photolithography-Reference-Cited by-同舟云学术

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Adaptive control of photolithography

Published:1992-01 Issue:1 Volume:38 Page:1-14
ISSN:0001-1541
Container-title:AIChE Journal
language:en
Short-container-title:AIChE J.

Author:

Crisalle Oscar D.,Soper Robert A.,Mellichamp Duncan A.,Seborg Dale E.

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Estimación y modelización de arrastres de orgánico en acuoso (O/A) en pruebas de laboratorio de planta de extracción por solventes (SX) de cobre;Revista de Metalurgia;2013-04-30

2. The role of process system engineering (PSE) in integrated circuit (IC) manufacturing;Control Engineering Practice;2007-07

3. Yield Enhancement in Photolithography Through Model-Based Process Control: Average Mode Control;IEEE Transactions on Semiconductor Manufacturing;2005-02

4. Neural network-based run-to-run controller using exposure and resist thickness adjustment;SPIE Proceedings;2003-06-30

5. Nonlinear modeling and multivariable control of photolithography;IEEE Transactions on Semiconductor Manufacturing;2002-08

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