Demonstration of a nanolithographic technique using a self-assembled monolayer resist for neutral atomic cesium-Reference-Cited by-同舟云学术

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Demonstration of a nanolithographic technique using a self-assembled monolayer resist for neutral atomic cesium

Published:1997-01 Issue:1 Volume:9 Page:52-55
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Prentiss Mara,Berggren Karl K.,Younkin Rebecca,Cheung Eunice,Tinkham Michael,Ralph Daniel C.,Black Charles T.,Whitesides George M.,Black Andrew J.

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference17 articles.

1. Atom optics

2. Using light as a lens for submicron, neutral-atom lithography

3. Laser-Focused Atomic Deposition

4. Light force cooling, focusing, and nanometer-scale deposition of aluminum atoms

5. Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Alkanethiolate Self-Assembled Monolayers As a Negative or Positive Resist for Electron Lithography;The Journal of Physical Chemistry C;2009-02-23

2. Optimization of laser-focused deposition lines: Rydberg atoms;The Journal of Chemical Physics;2006-07-14

3. Surface patterning and its application in wetting/dewetting studies;Current Opinion in Colloid & Interface Science;2001-02

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