Field-Induced Transition from Room-Temperature Ferromagnetism to Diamagnetism in Proton-Irradiated Fullerene-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Field-Induced Transition from Room-Temperature Ferromagnetism to Diamagnetism in Proton-Irradiated Fullerene

Published:2013-08-15 Issue:39 Volume:25 Page:5663-5667
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Lee Kyu Won¹,Kweon Hyocheon¹,Lee Cheol Eui¹

Affiliation:

1. Department of Physics and Institute for Nano Science; Korea University; Seoul 136-713 Republic of Korea

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma201301635/fullpdf

Reference46 articles.

1. Magnetic carbon

2. Induced Magnetic Ordering by Proton Irradiation in Graphite

3. Electron Spin Resonance of Proton-Irradiated Graphite

4. Unconventional magnetism in all-carbon nanofoam

5. Irradiation-Induced Magnetism in Carbon Nanostructures

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-temperature vacancy-induced magnetism in nanostructured materials;Physical Review B;2023-10-09

2. Interfacial Engineering Enabled the Tunability of Organic Spin Polarization;ACS Materials Letters;2022-11-07

3. Interfacial Engineering Enabled the Tunability of Organic Spin Polarization;ACS MATER LETT;2022

4. Tunable room temperature ferromagnetism in fullerene thin film induced by 1 MeV proton microbeam irradiation;Thin Solid Films;2022-08

5. The structural modification and magnetism of many-layer epitaxial graphene implanted with low-energy light ions;Carbon;2022-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3