Iron-Copper Nitride Thin Films Fabricated by Sputtering-Reference-Cited by-同舟云学术

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Iron-Copper Nitride Thin Films Fabricated by Sputtering

Published:2015-12-25 Issue: Volume: Page:239-250
ISSN:1940-6339
Container-title:Developments in Strategic Ceramic Materials
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Author:

Wang Xingwu,Parry James P.,Kamat Hrishikesh,Pan Ruikun,Zeng Hao

Publisher

John Wiley & Sons, Inc.

Reference13 articles.

1. Synthesis of Iron -Nitride Films by means of Ion Beam Deposition;Terada;IEEE Trans. Magn.,1987

2. Rf-Diode-Sputtered Iron Ntride Films for Thin-Film Recording Head Materials;Wang;J. Appl. Phys.,1990

3. Magnetic, Mcrostructural, and Compositional Characterization of Fe-N Thin Films for Recording Sensor Applicaions;Kim;J. Vac. Sci. Technol. A,1995

4. Magnetic Film Inductors for Radio Frequency Applications;Koreniviski;J. Appl. Phys.,1997

5. Magnetic Properties of Amorphous Iron Ntride Films by Ion-Beam Sputtering;Dubey;J. Appl. Phys.,2005

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Magnetic Studies of Copper Incorporated Iron Nitride Thin Films;Proceedings of the 41st International Conference on Advanced Ceramics and Composites;2018-02-06

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