Characterization of AlGaInN layers using X-ray diffraction and fluorescence

Author:

Groh Lars,Hums Christoph,Bläsing Jürgen,Krost Alois,Dadgar Armin

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nitride Semiconductors;Metalorganic Vapor Phase Epitaxy (MOVPE);2019-08-30

2. Electric field dynamics in nitride structures containing quaternary alloy (Al, In, Ga)N;Journal of Applied Physics;2016-07-07

3. Polarization engineering of c -plane InGaN quantum wells by pulsed-flow growth of AlInGaN barriers;physica status solidi (b);2015-11-30

4. Trends and Future Prospects;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19

5. Evaluation of interpolations of InN, AlN and GaN lattice and elastic constants for their ternary and quaternary alloys;Journal of Physics D: Applied Physics;2013-05-31

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