Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers-Reference-Cited by-同舟云学术

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Light induced crystallization of an amorphous silicon film embedded between silicon oxide layers

Published:2013-10-01 Issue:2 Volume:251 Page:439-445
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Phys. Status Solidi B

Author:

Schade Martin¹²,Mchedlidze Teimuraz³,Kittler Martin³⁴,Leipner Hartmut S.¹

Affiliation:

1. Interdisziplinäres Zentrum für Materialwissenschaften; Martin-Luther-Universität Halle-Wittenberg; 06099 Halle Germany

2. Zentrum für Innovationskompetenz SiLi-nano; Martin-Luther-Universität Halle-Wittenberg; Karl-Freiherr-von-Fritsch-Str. 3 06120 Halle Germany

3. Jointlab IHP/BTU; Konrad-Wachsmann-Allee 1; 03046 Cottbus Germany

4. IHP microelectronics; Im Technologiepark 25; 15236 Frankfurt (Oder) Germany

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference43 articles.

1. Improvement of electrical properties of silicon-based thin-film transistors by modifying technological fabrication processes

2. Nickel induced crystallization of amorphous silicon thin films

3. Aluminum-induced crystallization of amorphous silicon on glass substrates above and below the eutectic temperature

4. Solid-phase crystallized Si films on glass substrates for thin film solar cells

5. Polycrystalline silicon thin film solar cells prepared by PECVD-SPC

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Feasibility Study of Single-Crystal Si Island Manufacturing by Microscale Printing of Nanoparticles and Laser Crystallization;ACS Applied Materials & Interfaces;2019-08-23

2. Distinction between amorphous and crystalline silicon by means of electron energy-loss spectroscopy;Applied Physics A;2015-04-29

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