Enabling fabrication of clean electrical contacts to carbon nanotubes using oxygen plasma ashing-Reference-Cited by-同舟云学术

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Enabling fabrication of clean electrical contacts to carbon nanotubes using oxygen plasma ashing

Published:2016-07-12 Issue:12 Volume:253 Page:2417-2423
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Phys. Status Solidi B

Author:

Liu Wei¹,Chikkadi Kiran¹,Hierold Christofer¹,Haluska Miroslav¹

Affiliation:

1. Micro and Nanosystems; Department of Mechanical and Process Engineering; ETH Zurich 8092 Zurich Switzerland

Funder

ETH Zurich and Swiss COST action NanoTP

ETH-FIRST and BRNC

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Carbon nanotube based ultra-low voltage integrated circuits: Scaling down to 0.4 V

2. A Low Power Carbon Nanotube Chemical Sensor System

3. Sub-10 nm Carbon Nanotube Transistor

4. High-Field Electrical Transport in Single-Wall Carbon Nanotubes

5. Review of carbon nanotube nanoelectronics and macroelectronics

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