Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin‐film deposition-Reference-Cited by-同舟云学术

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Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin‐film deposition

Published:2017-07-13 Issue:10 Volume:254 Page:1700091
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Phys. Status Solidi B

Author:

Salami Hossein¹,Ramakrishnasubramanian Krishnaprasath¹,Adomaitis Raymond A.¹

Affiliation:

1. Department of Chemical and Biomolecular EngineeringInstitute for Systems ResearchUniversity of MarylandCollege Park, MD 20742USA

Funder

National Science Foundation

Goddard Space Flight Center

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssb.201700091

Reference24 articles.

1. A. C.JonesandM. L.Hitchman Chemical Vapor Deposition: Precursors Processes and Applications(Royal Society of Chemistry London 2009) p. 158.

2. Multiple Equilibria in Complex Chemical Reaction Networks: II. The Species-Reaction Graph

3. Reaction factorization for the dynamic analysis of atomic layer deposition kinetics

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2. Reaction Network Viewer (ReNView): An open-source framework for reaction path visualization of chemical reaction systems;SoftwareX;2020-01

3. Atomic layer deposition of ultrathin indium oxide and indium tin oxide films using a trimethylindium, tetrakis(dimethylamino)tin, and ozone precursor system;Journal of Vacuum Science & Technology A;2019-01

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