Dynamic computer simulations of Cs incorporation in Si during low-energy (0.2-3 keV) irradiation
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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3. Unravelling the secrets of Cs controlled secondary ion formation: Evidence of the dominance of site specific surface chemistry, alloying and ionic bonding;Surface Science Reports;2013-03
4. Cs incorporation in semiconductors during low-energy bombardment: A dynamic computer simulation study;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-09
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