Industrial High Throughput Emitter Formation and Thermal Oxidation for Silicon Solar Cells by the High Temperature Stack Oxidation Approach-Reference-Cited by-同舟云学术

Industrial High Throughput Emitter Formation and Thermal Oxidation for Silicon Solar Cells by the High Temperature Stack Oxidation Approach

Published:2021-10-19 Issue:24 Volume:218 Page:2100591
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Physica Status Solidi (a)

Author:

Meßmer Marius¹^ORCID,Lohmüller Sabrina¹,Weber Julian¹,Wolf Andreas¹

Affiliation:

1. Photovoltaic Production Technology Fraunhofer Institute for Solar Energy Systems (ISE) Heidenhofstraße 2 79110 Freiburg Germany

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202100591

Reference25 articles.

1. 22.8% efficient silicon solar cell

2. Passivated emitter and rear cell—Devices, technology, and modeling

3. ITRPV Consortium “International Technology Roadmap for Photovoltaic (ITRPV): Results 2019 11th edition ”11th ed. April2020.

4. M.Meßmer S.Lohmüller J.Weber A.Piechulla S.Nold J.Horzel A.Wolf in37th EU PVSEC WIP GmbH & Co Planungs‐KG Munich Munich2020 pp.370–377.

5. M.Mühlbauer A.Piechulla C.Voyer M.Citro R.Dahl P.Fath in26th EU PVSEC WIP GmbH & Co Planungs‐KG MunichHamburg 2011.

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