Flexible Complementary Metal‐Oxide‐Semiconductor Inverter Based on 2D p‐type WSe2 and n‐type MoS2

Author:

Piacentini Agata12ORCID,Polyushkin Dmitry K.3ORCID,Uzlu Burkay1ORCID,Grundmann Annika4ORCID,Heuken Michael45ORCID,Kalisch Holger4,Vescan Andrei4ORCID,Wang Zhenxing1ORCID,Lemme Max C.12ORCID,Mueller Thomas3ORCID,Neumaier Daniel16ORCID

Affiliation:

1. Advanced Microelectronic Center Aachen (AMICA) AMO GmbH 52074 Aachen Germany

2. Chair of Electronic Devices RWTH Aachen University 52074 Aachen Germany

3. Institute of Photonics TU Wien 1040 Vienna Austria

4. Compound Semiconductor Technology RWTH Aachen University 52074 Aachen Germany

5. AIXTRON SE 52134 Herzogenrath Germany

6. Bergische Universität Wuppertal 42119 Wuppertal Germany

Abstract

Transition metal dichalcogenides (TMDCs) are a promising class of two‐dimensional (2D) materials for flexible electronic applications due to their low integration temperature, good electronic properties, and excellent mechanical flexibility. Moreover, TMDCs offer the possibility of co‐integrating both n‐ and p‐type transistors on the same substrate, enabling the realization of complementary metal‐oxide‐semiconductor (CMOS) circuits. In this study, n‐type MoS2 field‐effect transistors (FETs), and p‐type WSe2‐FETs integrated on a flexible foil substrate fabricated by standard thin‐film technology are presented. These devices exhibit high stability in their electronic operation under strain and repeated bending cycles. A CMOS inverter based on these transistors is also successfully demonstrated, which shows excellent switching behaviour with high gain (up to 100), high noise margin (0.87 · VDD), and low average static power consumption (40 pW).

Funder

H2020 European Research Council

Deutsche Forschungsgemeinschaft

Publisher

Wiley

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