Plasma Post‐Treatment Process‐Induced Grain Coalescence to Improve the Electron Field‐Emission Properties of Ultrananocrystalline Diamond Films-Reference-Cited by-同舟云学术

Plasma Post‐Treatment Process‐Induced Grain Coalescence to Improve the Electron Field‐Emission Properties of Ultrananocrystalline Diamond Films

Published:2022-10-28 Issue:23 Volume:219 Page:2200362
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Physica Status Solidi (a)

Author:

Chen Chengke¹,He Zhi¹,Chen Wei-En²,Yeh Chien-Ray³,Lin Chii-Ruey²,Leou Keh-Chyang³,Lin I-Nan⁴,Hu Xiaojun¹^ORCID

Affiliation:

1. College of Materials Science and Engineering Zhejiang University of Technology Hangzhou Zhejiang 310014 China

2. Department of Mechanical Engineering and Institute of Manufacturing Technology National Taipei University of Technology Taipei Taiwan

3. Department of Engineering System and Science National Tsing-Hua University Hsin-Chu 30071 Taiwan

4. Department of Physics Tamkang University New-Taipei 25137 Taiwan

Funder

National Natural Science Foundation of China

Natural Science Foundation of Zhejiang Province

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202200362

Reference40 articles.

1. Quantum photoyield of diamond(111)—A stable negative-affinity emitter

2. Field emission at 10Vcm−1 with surface emission cathodes on negative-electron-affinity insulators

3. Low-Field Electron Emission from Undoped Nanostructured Diamond

4. A. R.Krauss D. M.Gruen D.Zhou T. G.McCauley Q.Lu Chang T.Corrigan O.Auciello R. P. H.Chang inChem. Aspects of Elec. Ceramics Proc. Boston 1998 pp.299–310.

5. Electron field emission for ultrananocrystalline diamond films

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