Laser‐Assisted Growth of Fe3O4 Nanoparticle Films on Silicon Substrate in Open Air

Author:

Krajewski Marcin1ORCID,Kaczmarek Agata1ORCID,Tokarczyk Mateusz2ORCID,Lewińska Sabina3ORCID,Włoczewski Mateusz4,Bochenek Kamil1ORCID,Jarząbek Dariusz M.14ORCID,Mościcki Tomasz1ORCID,Hoffman Jacek1ORCID,Ślawska-Waniewska Anna3ORCID

Affiliation:

1. Institute of Fundamental Technological Research Polish Academy of Sciences Pawinskiego 5B 02-106 Warsaw Poland

2. Faculty of Physics University of Warsaw Pasteura 5 02-093 Warsaw Poland

3. Institute of Physics Polish Academy of Sciences Al. Lotnikow 32/46 02-668 Warsaw Poland

4. Warsaw University of Technology Pl. Politechniki 1 00-661 Warsaw Poland

Abstract

This work presents a growth of Fe3O4 nanoparticle films on silicon substrate. The iron oxide is deposited applying a pulsed laser deposition technique. The process is performed in open air in the absence and presence of external magnetic field. In fact, the morphologies of the obtained Fe3O4–Si samples are similar. The Fe3O4 nanoparticles are spherical with average diameters of 30 nm and are densely agglomerated on the Si substrate. The Fe3O4–Si material prepared in the absence of magnetic field has revealed more intense signals during X‐ray diffraction and Raman measurements. The magnetic investigations indicate that the Fe3O4 nanoparticles are significantly coupled with the Si substrate and do not exhibit superparamagnetic behavior. Moreover, the Verwey transition is 98 K for both investigated Fe3O4–Si samples.

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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