Growth Optimization of Nonpolar Al 0.7 Sc 0.3 N(112¯0)/Al 2 O 3 (11¯02) Thin Films Using Reactive Magnetron Sputter Epitaxy-Reference-Cited by-同舟云学术

Growth Optimization of Nonpolar Al _0.7 Sc _0.3 N(112¯0)/Al ₂ O ₃ (11¯02) Thin Films Using Reactive Magnetron Sputter Epitaxy

Published:2022-10-28 Issue:24 Volume:219 Page:2200380
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Physica Status Solidi (a)

Author:

Nair Akash¹^ORCID,Kessel Maximilian¹,Kirste Lutz¹^ORCID,Feil Niclas M.²,Prescher Mario¹,Žukauskaitė Agnė¹

Affiliation:

1. Department of Epitaxy Fraunhofer Institute for Applied Solid State Physics IAF 79108 Freiburg Germany

2. Department of Sustainable Systems Engineering-INATECH University of Freiburg 79110 Freiburg Germany

Funder

Österreichische Forschungsförderungsgesellschaft

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202200380

Reference54 articles.

1. Influence of growth temperature and scandium concentration on piezoelectric response of scandium aluminum nitride alloy thin films

2. Effect of scandium content on structure and piezoelectric properties of AlScN films deposited by reactive pulse magnetron sputtering

3. Increased electromechanical coupling in w−ScxAl1−xN

4. Enhanced electromechanical coupling in SAW resonators based on sputtered non-polar Al0.77Sc0.23N 11 2 ¯ 0 thin films

5. Piezoelectric aluminum nitride thin films for microelectromechanical systems

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