Investigation into Oxidation Width of AlGaOx Cladding Layer for Circular Defect in 2D Photonic Crystal Laser

Author:

Zuo Rubing1ORCID,Ye Hanqiao1,Kinoshita Ryosei1,Kataguchi Munenari1,Morifuji Masato1,Kajii Hirotake1,Maruta Akihiro1,Kondow Masahiko1

Affiliation:

1. Department of Quantum Information Electronics Graduate School of Engineering Osaka University 2-1 Yamada-oka, Suita Osaka 565-0871 Japan

Abstract

A circular defect in 2D photonic crystal (CirD) lasers is developed, which has the potential to achieve a target communication density of 10 Pbps cm−2 for intrachip optical communications by vertical current injection. The AlGaOx cladding layer's oxidation width strongly influences the device's light confinement and electronic resistance. Herein, samples with different oxidation widths are fabricated and the relationship between threshold power and oxidation width through photoexcitation is revealed. The optimal range of the oxidation width is found to be 349–439 nm, which can ensure low electronic resistance and low threshold power.

Funder

Japan Society for the Promotion of Science

Ministry of Education, Culture, Sports, Science and Technology

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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