A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces-Reference-Cited by-同舟云学术

A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces

Published:2022-08-12 Issue:4 Volume:220 Page:2200351
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Physica Status Solidi (a)

Author:

Schätzle Philip¹^ORCID,Reinke Philipp²^ORCID,Herrling David²,Götze Arne¹^ORCID,Lindner Lukas²^ORCID,Jeske Jan²^ORCID,Kirste Lutz²^ORCID,Knittel Peter²^ORCID

Affiliation:

1. Department of Sustainable Systems Engineering (INATECH) University of Freiburg Emmy-Noether-Straße 2 79110 Freiburg Germany

2. Fraunhofer Institute for Applied Solid State Physics Fraunhofer IAF Tullastraße 72 79108 Freiburg Germany

Funder

Horizon 2020 Framework Programme

Carl-Zeiss-Stiftung

Fraunhofer-Gesellschaft

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202200351

Reference35 articles.

1. Microwave engineering of plasma-assisted CVD reactors for diamond deposition

2. Novel microwave plasma-assisted CVD reactor for diamond delta doping

3. Influence of CVD diamond growth conditions on nitrogen incorporation

4. Early stages of plasma synthesis of diamond films

5. Diamond power devices: state of the art, modelling, figures of merit and future perspective

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