In Situ Plasma Studies Using a Direct Current Microplasma in a Scanning Electron Microscope

Author:

Grünewald Lukas1ORCID,Chezganov Dmitry12ORCID,De Meyer Robin123ORCID,Orekhov Andrey1ORCID,Van Aert Sandra12ORCID,Bogaerts Annemie3ORCID,Bals Sara12ORCID,Verbeeck Jo1ORCID

Affiliation:

1. EMAT University of Antwerp Groenenborgerlaan 171 Antwerp B‐2020 Belgium

2. NANOlab Center of Excellence University of Antwerp Groenenborgerlaan 171 Antwerp B‐2020 Belgium

3. PLASMANT University of Antwerp Universiteitsplein 1 Antwerpen‐Wilrijk B‐2610 Belgium

Abstract

AbstractMicroplasmas can be used for a wide range of technological applications and to improve the understanding of fundamental physics. Scanning electron microscopy, on the other hand, provides insights into the sample morphology and chemistry of materials from the mm‐ down to the nm‐scale. Combining both would provide direct insight into plasma‐sample interactions in real‐time and at high spatial resolution. Up till now, very few attempts in this direction have been made, and significant challenges remain. This work presents a stable direct current glow discharge microplasma setup built inside a scanning electron microscope. The experimental setup is capable of real‐time in situ imaging of the sample evolution during plasma operation and it demonstrates localized sputtering and sample oxidation. Further, the experimental parameters such as varying gas mixtures, electrode polarity, and field strength are explored and experimental VI curves under various conditions are provided. These results demonstrate the capabilities of this setup in potential investigations of plasma physics, plasma‐surface interactions, and materials science and its practical applications. The presented setup shows the potential to have several technological applications, for example, to locally modify the sample surface (e.g., local oxidation and ion implantation for nanotechnology applications) on the µm‐scale.

Funder

Fonds Wetenschappelijk Onderzoek

Universiteit Antwerpen

Publisher

Wiley

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3