High‐Efficiency Silicon Nanowire Array Near Infrared Photodetectors via Length Control and SiOx Surface Passivation

Author:

Son Bongkwon1,Shin Sang‐Ho12,Zhao Zhi‐Jun3,Ju Byeong‐Kwon2,Jeong Jun‐Ho4,Kim Munho1ORCID,Tan Chuan Seng1

Affiliation:

1. School of Electrical and Electronic Engineering Nanyang Technological University 50 Nanyang Avenue Singapore 639798 Singapore

2. School of Electrical Engineering Korea University 145 Anam‐ro Seongbuk‐gu Seoul 02841 South Korea

3. Institute of Smart City and Intelligent Transportation Southwest Jiaotong University No. 999 Pidu District Chengdu Sichuan 611756 China

4. Nano‐Convergence Mechanical Systems Research Division Korea Institute of Machinery and Materials 156, Gajeongbuk‐ro, Yuseong‐gu Daejeon 34103 South Korea

Abstract

AbstractSilicon (Si) nanowire (NW) array is a promising light‐trapping platform due to the strong interaction between light and nanostructure. A photodetector benefits from the improved optical absorption in the Si NW array. Although the optical absorption increases with the NW length, the large NW length is not always preferable owing to the large surface area. Herein, the systematic study on the Si NW array photodetectors with varied NW lengths is investigated. It is revealed that the photodetectors with 1 µm length provide a highest responsivity of 0.65 A W−1 and a specific detectivity of 1.40 × 109 cm Hz1/2 W−1 at the wavelength of 1000 nm, including the dark current of 54 µA at 1 V. In addition, the silicon oxide (SiOx) surface passivation is introduced to induce the high photogain. As a result, the responsivity is improved by 13 times (0.55 A W−1) at 1100 nm. This work proposes high‐efficiency Si NW array photodetectors by the NW array length control and the SiOx surface passivation.

Funder

Ministry of Education

Publisher

Wiley

Subject

Industrial and Manufacturing Engineering,Mechanics of Materials,General Materials Science

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