Direct Writing of Shape‐Gradient Magnetic Alloy Microwire Arrays with Meniscus‐Confined Electrodeposition Process-Reference-Cited by-同舟云学术

Direct Writing of Shape‐Gradient Magnetic Alloy Microwire Arrays with Meniscus‐Confined Electrodeposition Process

Published:2022-05-20 Issue:10 Volume:7 Page:2200024
ISSN:2365-709X
Container-title:Advanced Materials Technologies
language:en
Short-container-title:Adv Materials Technologies

Author:

Nie Weiye¹²^ORCID,Lei Yu²,Zhang Yifan²,Gao Qingqing²,Chen Jiangang²,Zhang Xianyun³,Yuan Lifeng⁴,Cheng Yuchuan²,Sun Aihua²,Wang Gang¹,Xu Gaojie²,Guo Jianjun²^ORCID

Affiliation:

1. School of Materials Science and Engineering Shanghai University Shanghai 200444 P. R. China

2. Zhejiang Key Laboratory of Additive Manufacturing Materials Ningbo Institute of Materials Technology & Engineering Chinese Academy of Sciences Ningbo 315201 P. R. China

3. Division of Physical Sciences and Engineering King Abdullah University of Science and Technology Thuwal 23955‐6900 Kingdom of Saudi Arabia

4. Technology Center of Ningbo Customs Ningbo 315103 P. R. China

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Industrial and Manufacturing Engineering,Mechanics of Materials,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admt.202200024

Reference46 articles.

1. Morphology-Graded Silicon Nanowire Arrays via Chemical Etching: Engineering Optical Properties at the Nanoscale and Macroscale

2. Recent advances in antireflective surfaces based on nanostructure arrays

3. Large-area fabrication of superhydrophobic micro-conical pillar arrays on various metallic substrates

4. Stability of High-Aspect-Ratio Micropillar Arrays against Adhesive and Capillary Forces

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