A novel method for the discharge of electrostatic mirror formations in the scanning electron microscope
Author:
Affiliation:
1. Centre for IC Failure Analysis and Reliability, Faculty of Engineering, National University of Singapore, Singapore
Publisher
Wiley
Subject
Instrumentation,Atomic and Molecular Physics, and Optics
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/sca.4950190708
Reference11 articles.
1. Scanning Electron Microscopy and X-Ray Microanalysis
2. Coating Techniques for SEM and Microanalysis
3. A model for calculating secondary and backscattered electron yields
4. Control of charging in low-voltage SEM
5. Environmental SEM and conventional SEM imaging of electron-sensitive resist: Contrast quality and metrological applications
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1. A comparison of conventional Everhart-Thornley style and in-lens secondary electron detectors-a further variable in scanning electron microscopy;Scanning;2011-05
2. Parameters and mechanisms governing image contrast in scanning electron microscopy of single-walled carbon nanotubes;Scanning;2006-12-07
3. Factors governing the discharge of electrostatic mirror formations in the scanning electron microscope;Review of Scientific Instruments;1998-01
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