Shot noise in electron-beam lithography and line-width measurements-Reference-Cited by-同舟云学术

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Shot noise in electron-beam lithography and line-width measurements

Published:2006-12-07 Issue:1 Volume:28 Page:20-26
ISSN:0161-0457
Container-title:Scanning
language:en
Short-container-title:Scanning

Author:

Kruit P.,Steenbrink S. W. H. K.

Publisher

Wiley

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

Reference17 articles.

1. Addition of different contributions to the charged particle probe size;Barth;Optik,1996

2. Modelbased two-object resolution from observations having counting statistics;Bettens;Ultramicroscopy,1999

3. Resist blur and line edge roughness. Optical Micro-lithography XVIII;Gallatin;Proc SPIE,2005

4. Modeling of edge roughness in ion projection lithography;Henke;J Vac Sci Technol B,1999

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1. Applications in Microscopy and Lithography for a Heralded Electron Source;2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC);2023-07-10

2. Thermal conductivity in disordered porous nanomembranes;Nanotechnology;2019-04-12

3. CAD/CAM for scalable nanomanufacturing: A network-based system for hybrid 3D printing;Microsystems & Nanoengineering;2017-09-25

4. Simulation of shotnoise induced side-wall roughness in electron lithography;SPIE Proceedings;2016-03-08

5. Determination of line edge roughness in low-dose top-down scanning electron microscopy images;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-08-13

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