Selective Antisite Defect Formation in WS 2 Monolayers via Reactive Growth on Dilute W‐Au Alloy Substrates-Reference-Cited by-同舟云学术

Selective Antisite Defect Formation in WS 2 Monolayers via Reactive Growth on Dilute W‐Au Alloy Substrates

Published:2021-11-19 Issue:3 Volume:34 Page:2106674
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Advanced Materials

Author:

Wang Kai¹,Zhang Lizhi²,Nguyen Giang D.¹,Sang Xiahan¹³⁴,Liu Chenze¹,Yu Yiling¹,Ko Wonhee¹,Unocic Raymond R.¹,Puretzky Alexander A.¹,Rouleau Christopher M.¹,Geohegan David B.¹,Fu Lei⁵,Duscher Gerd⁶,Li An‐Ping¹,Yoon Mina¹,Xiao Kai¹^ORCID

Affiliation:

1. Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge TN 37831 USA

2. Department of Physics and Astronomy University of Tennessee Knoxville TN 37916 USA

3. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing Wuhan University of Technology Luoshi Road 122 Wuhan 430070 China

4. Nanostructure Research Centre Wuhan University of Technology Luoshi Road 122 Wuhan 430070 China

5. College of Chemistry and Molecular Science Wuhan University Wuhan 430072 China

6. Department of Materials Science and Engineering University of Tennessee Knoxville TN 37916 USA

Funder

U.S. Department of Energy

Office of Science

Basic Energy Sciences

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

National Energy Research Scientific Computing Center

Publisher

Wiley