Spatially Controlled UV Light Generation at Depth using Upconversion Micelles

Author:

Zhou Qi1ORCID,Wirtz Brendan M.2ORCID,Schloemer Tracy H.1ORCID,Burroughs Michael C.2ORCID,Hu Manchen1ORCID,Narayanan Pournima13ORCID,Lyu Junrui1ORCID,Gallegos Arynn O.1ORCID,Layton Colette1,Mai Danielle J.2ORCID,Congreve Daniel N.1ORCID

Affiliation:

1. Department of Electrical Engineering Stanford University Stanford 94305 CA USA

2. Department of Chemical Engineering Stanford University Stanford 94305 CA USA

3. Department of Chemistry Stanford University Stanford 94305 CA USA

Abstract

AbstractUV light can trigger a plethora of useful photochemical reactions for diverse applications, including photocatalysis, photopolymerization, and drug delivery. These applications typically require penetration of high‐energy photons deep into materials, yet delivering these photons beyond the surface is extremely challenging due to absorption and scattering effects. Triplet–triplet annihilation upconversion (TTA‐UC) shows great promise to circumvent this issue by generating high‐energy photons from incident lower‐energy photons. However, molecules that facilitate TTA‐UC usually have poor water solubility, limiting their deployment in aqueous environments. To address this challenge, a nanoencapsulation method is leveraged to fabricate water‐compatible UC micelles, enabling on‐demand UV photon generation deep into materials. Two iridium‐based complexes are presented for use as TTA‐UC sensitizers with increased solubilities that facilitate the formation of highly emissive UV‐upconverting micelles. Furthermore, this encapsulation method is shown to be generalizable to nineteen UV‐emitting UC systems, accessing a range of upconverted UV emission profiles with wavelengths as low as 350 nm. As a proof‐of‐principle demonstration of precision photochemistry at depth, UV‐emitting UC micelles are used to photolyze a fluorophore at a focal point nearly a centimeter beyond the surface, revealing opportunities for spatially controlled manipulation deep into UV‐responsive materials.

Funder

Gordon and Betty Moore Foundation

Arnold and Mabel Beckman Foundation

National Science Foundation

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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