A Novel N‐Type Molecular Dopant With a Closed‐Shell Electronic Structure Applicable to the Vacuum‐Deposition Process

Author:

Matsuo Takaya12,Kawabata Kohsuke12ORCID,Takimiya Kazuo123ORCID

Affiliation:

1. Department of Chemistry Graduate School of Science Tohoku University 6‐3 Aoba, Aramaki, Aoba‐ku Sendai Miyagi 980‐8578 Japan

2. RIKEN Center for Emergent Matter Science (CEMS) 2‐1 Hirosawa Wako Saitama 351‐0198 Japan

3. Advanced Institute for Materials Research (WPI‐AIMR) Tohoku University 2‐1‐1 Katahira, Aoba‐ku Sendai Miyagi 980‐8577 Japan

Abstract

AbstractRational design, synthesis, and characterization of a new efficient versatile n‐type dopant with a closed‐shell electronic structure are described. By employing the tetraphenyl–dipyranylidene (DP0) framework with two 7π‐electron systems modified with N,N‐dimethylamino groups as the strong electron‐donating substituent, 2,2′,6,6′‐tetrakis[4‐(dimethylamino)phenyl]‐4,4′‐dipyranylidene (DP7), a closed‐shell molecule with an extremely high‐lying energy level of the highest occupied molecular orbital, close to 4.0 eV below the vacuum level, is successfully developed. Thanks to its thermal stability, DP7 is applicable to vacuum deposition, which allows utilization of DP7 in bulk doping for the development of n‐type organic thermoelectric materials and contact doping for reducing contact resistance in n‐type organic field‐effect transistors. As vacuum‐deposition processable n‐type dopants are very limited, DP7 stands out as a useful n‐type dopant, particularly for the latter purpose.

Funder

Japan Society for the Promotion of Science

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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