Enhancing Stability and Performance in Tin‐Based Perovskite Field‐Effect Transistors Through Hydrogen Bond Suppression of Organic Cation Migration

Author:

Yang Wenshu1,Zhang Kai1,Yuan Wei23,Zhang Lijun1,Qin Chuanjiang23,Wang Haibo1ORCID

Affiliation:

1. Key Laboratory of Automobile Materials of Ministry of Education School of Materials Science and Engineering Jilin University Changchun 130012 P. R. China

2. State Key Laboratory of Polymer Physics and Chemistry Changchun Institute of Applied Chemistry Chinese Academy of Sciences Changchun 130022 P. R. China

3. School of Applied Chemistry and Engineering University of Science and Technology of China Hefei 230026 China

Abstract

AbstractIon migration poses a substantial challenge in perovskite transistors, exerting detrimental effects on hysteresis and operational stability. This study focuses on elucidating the influence of ion migration on the performance of tin‐based perovskite field‐effect transistors (FETs). It is revealed that the high background carrier density in FASnI3 FETs arises not only from the oxidation of Sn2+ but also from the migration of FA+ ions. The formation of hydrogen bonding between FA+ and F ions efficiently inhibits ion migration, leading to a reduction in background carrier density and an improvement in the operational stability of the transistors. The strategy of hydrogen bond is extended to fluorine‐substituted additives to improve device performance. The incorporation of 4‐fluorophenethylammonium iodide additives into FETs significantly minimizes the shift of turn‐on voltage during cyclic measurements. Notably, an effective mobility of up to 30 cm2 V−1 s−1 with an Ion/off ratio of 107 is achieved. These findings hold promising potential for advancing tin‐based perovskite technology in the field of electronics.

Funder

National Natural Science Foundation of China

Natural Science Foundation of Jilin Province

Publisher

Wiley

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