Electron Release via Internal Polarization Fields for Optimal S‐H Bonding States

Author:

Seok Hyunho1ORCID,Kim Minjun1,Cho Jinill2,Son Sihoon1,Megra Yonas Tsegaye2,Lee Jinhyoung2,Nam Myeong Gyun3,Kim Keon‐Woo4,Aydin Kubra1,Yoo Seong Soo3,Lee Hyeonjeong2,Kanade Vinit K.2,Kim Muyoung5,Mun Jihun6,Kim Jin Kon4,Suk Ji Won127,Kim Hyeong‐U58,Yoo Pil J.139,Kim Taesung12ORCID

Affiliation:

1. SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University Suwon Gyeonggi‐do 16419 Republic of Korea

2. School of Mechanical Engineering Sungkyunkwan University Suwon Gyeonggi‐do 16419 Republic of Korea

3. School of Chemical Engineering Sungkyunkwan University Suwon Gyeonggi‐do 16419 Republic of Korea

4. Department of Chemical Engineering Pohang University of Science and Technology (POSTECH) Pohang Gyeongbuk 790‐784 Republic of Korea

5. Plasma Engineering Laboratory Korea Institute of Machinery and Materials Daejeon 34103 Republic of Korea

6. Advanced Instrumentation Institute Korea Research Institute of Standards and Science Daejeon 34113 Republic of Korea

7. Department of Smart‐Fab. Technology Sungkyunkwan University Suwon 16419 Republic of Korea

8. Nano‐Mechatronics, KIMM Campus University of Science and Technology (UST) Daejeon 34113 Republic of Korea

9. SKKU Institute of Energy Science and Technology (SIEST) Sungkyunkwan University Suwon Gyeonggi‐do 16419 Republic of Korea

Abstract

AbstractTransition metal dichalcogenides (TMDs) have received considerable attention as promising electrocatalysts for the hydrogen evolution reaction (HER), yet their potential is often constrained by the inertness of the basal planes arising from their poor hydrogen adsorption ability. Here, the relationship between the electronic structure of the WS2 basal plane and HER activity is systemically analyzed to establish a clear insight. The valance state of the sulfur atoms on the basal plane has been tuned to enhance hydrogen adsorption through sequential engineering processes, including direct phase transition and heterostructure that induces work function‐difference‐induced unidirectional electron transfer. Additionally, an innovative synthetic approach, harnessing the built‐in internal polarization field at the W‐graphene heterointerface, triggers the in‐situ formation of sulfur vacancies in the bottom WSx (x < 2) layers. The resultant modulation of the valance state of the sulfur atom stabilizes the W‐S bond, while destabilizing the S‐H bond. The electronic structural changes are further amplified by the release and transfer of surplus electrons via sulfur vacancies, filling the valance state of W and S atoms. Consequently, this work provides a comprehensive understanding of the interplay between the electronic structure of the WS2 basal plane and the HER activity, focusing on optimizing S‐H bonding state.

Funder

National Research Foundation

Ministry of Science and ICT, South Korea

Korea Institute of Machinery and Materials

Ministry of Trade, Industry and Energy

Ministry of Education

Publisher

Wiley

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