Author:
Weinstein R. D.,Richard J. G.,Bessel C. A.,Hanlon W. H.,Skaf D. W.
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Reference15 articles.
1. Removal of Copper from Silicon Surfaces Using Hexafluoroacetylacetone (hfacH) Dissolved in Supercritical Carbon Dioxide
2. Kinetics of cuprous oxide etching with β-diketones in Supercritical CO2
3. J. M. Steigerwals, S. P. Murarka, R. J. Gutmann, Chemical Mechanical Planarizaration of Microelectronic Materials, Wiley-VHC Verlag, Weinheim 2004.
4. Triangle National Lithography Center, Dry Fab of the Future, http://www.nsfstc.unc.edu/files/dryfab.ppt, accessed July 6, 2007.
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