Wafer yield prediction using derived spatial variables
Author:
Affiliation:
1. Department of Industrial Engineering; Tsinghua University; Beijing China
2. Department of Industrial Systems Engineering and Management; National University of Singapore; Singapore
Funder
National Natural Science Foundation of China
Publisher
Wiley
Subject
Management Science and Operations Research,Safety, Risk, Reliability and Quality
Reference37 articles.
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3. Mirza AI O'Donoghue G Drake AW Graves SC Spatial yield modeling for semiconductor wafers Cambridge, Massachusetts, USA 1995 276 281
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5. Statistical methods for visual defect metrology;Cunningham;IEEE Trans Semicond Manuf,1998
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