Application of X-ray fluorescence holography to the analysis of the interior and surface of an yttrium oxide thin film

Author:

Stellhorn Jens R.12ORCID,Hosokawa Shinya1ORCID,Happo Naohisa3,Tajiri Hiroo4,Matsushita Tomohiro4,Kaminaga Kenichi56,Fukumura Tomoteru67,Hasegawa Tetsuya5,Kimura Koji2ORCID,Hayashi Kouichi28

Affiliation:

1. Department of Physics; Kumamoto University; Kumamoto Japan

2. Department of Physical Science and Engineering; Nagoya Institute of Technology; Nagoya Japan

3. Graduate School of Information Sciences; Hiroshima City University; Hiroshima Japan

4. Japan Synchrotron Radiation Research Institute (JASRI); Hyogo Japan

5. Department of Chemistry; The University of Tokyo; Tokyo Japan

6. Department of Chemistry; Tohoku University; Sendai Japan

7. WPI Advanced Institute for Materials Research; Tohoku University; Sendai Japan

8. Frontier Research Institute for Materials Science; Nagoya Institute of Technology; Nagoya Japan

Funder

Japan Society for the Promotion of Science

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

1. X-ray holography with atomic resolution;Tegze;Nature,1996

2. A valence-selective X-ray fluorescence holography study of an yttrium oxide thin film;Stellhorn;J Appl Cryst,2017

3. A divalent rare earth oxide semiconductor: yttrium monoxide;Kaminaga;Appl Phys Lett,2016

4. A refinement of the crystal structure of yttria;Paton;Acta Cryst,1965

5. Properties of Y2O3 thin films applicable in micro-electrochemical cells;Ivanic;J Electr Eng,2003

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