Investigation of an atomic‐layer‐deposited Al 2 O 3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform-Reference-Cited by-同舟云学术

Investigation of an atomic‐layer‐deposited Al 2 O 3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform

Published:2021-05-11 Issue:8 Volume:53 Page:727-733
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf Interface Anal

Author:

Li Yujiao¹^ORCID,Zanders David²^ORCID,Meischein Michael³^ORCID,Devi Anjana²^ORCID,Ludwig Alfred¹³^ORCID

Affiliation:

1. ZGH Ruhr‐Universität Bochum Universitätsstr. 150 Bochum 44801 Germany

2. Inorganic Materials Chemistry Ruhr‐Universität Bochum Universitätsstr. 150 Bochum 44801 Germany

3. Materials Discovery and Interfaces, Institute for Materials Ruhr‐Universität Bochum Universitätsstr. 150 Bochum 44801 Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.6955

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