Author:
Vandervorst W.,Maes H. E.,De Keersmaecker R.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. A new approach to express ToF SIMS depth profiling;Surface and Interface Analysis;2015-05-04
2. Quantification of cesium surface contamination on silicon resulting from SIMS analysis;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-05
3. Quantitative Depth Profiling of Argon in Tungsten Films by Secondary Ion Mass Spectrometry.;Analytical Sciences;2001
4. Contributions to computer-aided interpretation of ion sputtering depth profiling;Spectrochimica Acta Part B: Atomic Spectroscopy;1994-09
5. On the determination of dopant/carrier distributions;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-01