Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography-Reference-Cited by-同舟云学术

Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography

Published:2017-01-09 Issue:11 Volume:13 Page:1603465
ISSN:1613-6810
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Author:

Menéndez Enric¹,Modarresi Hiwa¹,Petermann Claire¹,Nogués Josep²³,Domingo Neus²,Liu Haoliang⁴,Kirby Brian J.⁵,Mohd Amir Syed⁶,Salhi Zahir⁶,Babcock Earl⁶,Mattauch Stefan⁶,Van Haesendonck Chris⁴,Vantomme André¹,Temst Kristiaan¹

Affiliation:

1. KU Leuven; Instituut voor Kern- en Stralingsfysica; Celestijnenlaan 200 D 3001 Leuven Belgium

2. Catalan Institute of Nanoscience and Nanotechnology (ICN2); CSIC and The Barcelona Institute of Science and Technology; Campus UAB; Bellaterra 08193 Barcelona Spain

3. ICREA, Pg. Lluís Companys 23; 08010 Barcelona Spain

4. KU Leuven; Laboratorium voor Vaste-Stoffysica en Magnetisme; Celestijnenlaan 200 D 3001 Leuven Belgium

5. NIST Center for Neutron Research; National Institute of Standards and Technology; Gaithersburg Maryland 20899 USA

6. Jülich Centre for Neutron Science (JCNS) at Heinz Maier-Leibnitz Zentrum (MLZ); Forschungszentrum Jülich GmbH; 85747 Garching Germany

Funder

Fonds Wetenschappelijk Onderzoek

Concerted Research Action

Generalitat de Catalunya

European Commission

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

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4. Temperature Evolution of Spin Relaxation in aNiFe/CuLateral Spin Valve

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