Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism-Reference-Cited by-同舟云学术

Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism

Published:2018-03-24 Issue:16 Volume:14 Page:1704005
ISSN:1613-6810
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language:en
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Author:

Krishnan Mohan Raj¹,Lu Kai-Yuan¹,Chiu Wen-Yu²,Chen I-Chen¹,Lin Jheng-Wei¹,Lo Ting-Ya¹,Georgopanos Prokopios³⁴,Avgeropoulos Apostolos⁴,Lee Ming-Chang²,Ho Rong-Ming¹^ORCID

Affiliation:

1. Department of Chemical Engineering; National Tsing Hua University; Hsinchu 30013 Taiwan Republic of China

2. Department of Electrical Engineering; National Tsing Hua University; Hsinchu 30013 Taiwan Republic of China

3. Institute of Polymer Research; Helmoltz-Zentrum Geesthacht; Max-Planck-Str. 1 Geesthacht 21502 Germany

4. Department of Materials Science Engineering; University of Ioannina; University Campus; Ioannina 45110 Greece

Funder

National Science Council

Ministry of Science and Technology of the People's Republic of China

Seventh Framework Programme

LAMAND

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

Reference66 articles.

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3. Highly Aligned Ultrahigh Density Arrays of Conducting Polymer Nanorods using Block Copolymer Templates

4. Ordering in thin films of block copolymers: Fundamentals to potential applications

5. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order

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