Study of the kinetics of step and flash imprint lithography photopolymerization-Reference-Cited by-同舟云学术

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Study of the kinetics of step and flash imprint lithography photopolymerization

Published:2005 Issue:9 Volume:51 Page:2547-2555
ISSN:0001-1541
Container-title:AIChE Journal
language:en
Short-container-title:AIChE J.

Author:

Dickey Michael D.,Burns Ryan L.,Kim E. K.,Johnson Steve C.,Stacey Nick A.,Willson C. Grant

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Reference41 articles.

1. , , , , , , , , , , , . Proceedings of SPIE—The International Society for Optical Engineering 2003;5037: 197-202.

2. International Technology Roadmap for Semiconductors; Semiconductor Industry Association: San Jose; CA, 2003.

3. , , , , , , , , , . Proceedings of SPIE—The International Society for Optical Engineering 1999;3676: 379-389.

4. Sub-10 nm imprint lithography and applications

5. Pattern transfer to silicon by microcontact printing and RIE

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4. Modeling and Numerical Studies of Three‐Dimensional Conically Shaped Microwells Using Non‐Uniform Photolithography;Macromolecular Theory and Simulations;2022-01-12

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