Photolithography-Reference-Cited by-同舟云学术

Photolithography

Published:2018-08-06 Issue: Volume: Page:287-310
ISSN:
Container-title:Flat Panel Display Manufacturing
language:
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Author:

Nishimura Yasunori¹,Yano Kozo¹,Itoh Masataka²,Ito Masahiro³

Affiliation:

1. FPD Consultancy; 8-10-4 Nishitomigaoka Nara Japan 631-0006

2. Crystage Inc.; 2-7-38 Nishi-Miyahara Yodogawa-Ku Osaka Japan 532-0004

3. Electronics Division; Toppan Printing Co. Ltd.; 5-1, Taito 1-chome Taito-Ku Tokyo Japan 110-8560

Publisher

John Wiley & Sons Ltd

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781119161387.ch13/fullpdf

Reference8 articles.

1. Voltage-dependent optical activity of a twisted nematic liquid crystal;Schadt;Appl. Phys. Lett.,1971

2. A super-high-image-quality multi-domain vertical alignment LCD by new rubbing-less technology;Takeda;Digest SID Symposium,1998

3. Principles and characteristics of electro-optical behaviour with in-plane switching mode;Oh-e;Proc.of the 15th International Display Research Conference (Asia Display 95),1997

4. Economically sputtered black matrix systems for FPD applications;Bender;Digest 1996 Display Manufacturing Technology Conference,1996

5. The new process for preparing multicolor filter for LCDs;Matsumura;Proc. Eurodisplayb'90,1990

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