MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors-Reference-Cited by-同舟云学术

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MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors

Published:1999-01 Issue:1 Volume:5 Page:9-12
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Crosbie Michael J.,Wright Peter J.,Davies Hywel O.,Jones Anthony C.,J.Leedham Timothy,O’Brien Paul,Critchlow Gary W.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

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