Author:
Andrä G.,Bergmann J.,Falk F.,Ose E.,Stafast H.
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. XeCl Excimer Laser Annealing Used to Fabricate Poly-Si TFT's
2. , , , , , , , , and , Internat. Electron. Dev. Meeting Tech. Dig., IEEE, Piscataway 1991 (p. 563).
3. Comprehensive Study of Lateral Grain Growth in Poly-Si Films by Excimer Laser Annealing and Its Application to Thin Film Transistors
4. Single-crystal Si films for thin-film transistor devices
5. , , , , , , and , Proc. 14th Europ. Photovoltaic Solar Energy Conf., Eds. , and , H. S. Stephens & Ass., Bedford 1997 (p. 1411).
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