Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability-Reference-Cited by-同舟云学术

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Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability

Published:2010-07-23 Issue:4 Volume:24 Page:342-350
ISSN:0894-3230
Container-title:Journal of Physical Organic Chemistry
language:en
Short-container-title:J. Phys. Org. Chem.

Author:

Versace Davy Louis,Tehfe Mohamad Ali,Lalevée Jacques,Casarotto Virginie,Blanchard Nicolas,Morlet-Savary Fabrice,Fouassier Jean-Pierre

Publisher

Wiley

Subject

Organic Chemistry,Physical and Theoretical Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/poc.1762/fullpdf

Reference43 articles.

1. The sisyl (tris(trimethylsilyl)silyl) group: A fluoride resistant, photolabile alcohol protecting group

2. The photolytic and hydrolytic lability of sisyl (Si(SiMe3)3) ethers, an alcohol protecting group

3. Remarkable Tris(trimethylsilyl)silyl Group for Diastereoselective [2 + 2] Cyclizations

4. Tris(trimethylsilyl)silyl-Governed Aldehyde Cross-Aldol Cascade Reaction

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