Selective etching of polylactic acid in poly(styrene)-block-poly(d,l)lactide diblock copolymer for nanoscale patterning-Reference-Cited by-同舟云学术

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Selective etching of polylactic acid in poly(styrene)-block-poly(d,l)lactide diblock copolymer for nanoscale patterning

Published:2014-04-18 Issue:18 Volume:131 Page:n/a-n/a
ISSN:0021-8995
Container-title:Journal of Applied Polymer Science
language:en
Short-container-title:J. Appl. Polym. Sci.

Author:

Cummins Cian¹,Mokarian-Tabari Parvaneh¹²,Holmes Justin D.¹²,Morris Michael A.¹²

Affiliation:

1. Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland

2. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN); Trinity College Dublin; Dublin Ireland

Funder

Science Foundation Ireland

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/app.40798/fullpdf

Reference56 articles.

1. Enabling nanotechnology with self assembled block copolymer patterns

2. Polymer self assembly in semiconductor microelectronics

3. Nanostructure fabrication using block copolymers

4. Patterned Magnetic Media Made by Self-Assembled Block-Copolymer Lithography

5. Optoelectronics using block copolymers

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5. Triazole-Functionalized Mesoporous Materials Based on Poly(styrene-block-lactic acid): A Morphology Study of Thin Films;Polymers;2022-05-31

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