Multibit MoS2Photoelectronic Memory with Ultrahigh Sensitivity
Author:
Affiliation:
1. SKKU Advanced Institute of Nanotechnology (SAINT); Sungkyunkwan University; Suwon 440-746 Korea
2. Department of Physics; Sungkyunkwan University; Suwon 440-746 Korea
3. School of Chemical Engineering; Sungkyunkwan University; Suwon 440-746 Korea
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
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