An extended majority-carrier approach for the DC and small-signal simulation of ion-implanted mesfets on compensated and p-type substrates

Author:

Ghione Giovanni,Benvenuti Augusto,Pirola Marco,Naldi Carlo

Publisher

Wiley

Subject

Electrical and Electronic Engineering

Reference29 articles.

1. R. Anholt, T. W. Sigmon, M. D. Deal: Process and devices models for GaAs MESFET technology. Technical Digest of 1987 GaAs 1C Symp., Oct. 1987, Portland, p. 53-56.

2. Two-Dimensional Numerical Analysis of GaAs MESFET's with a p-Buffer Layer;Araki-Mishima;Electronics and Communications in Japan, Part 2,1988

3. T. M. Barton, C. M. Snowden, J. R. Richardson: The effect of surface, gate and buffer on the operation of GaAs MESFETs. 3rd Meeting of GaAs Simulation Group, Duisburg, 7-8 Oct. 1986.

4. The role of the device surface in the high voltage behaviour of the GaAs MESFET;Barton;Solid State Electronics,1986

5. A. Benvenuti, G. Ghione, C. Naldi: GaAs doping profile reconstruction from CV measurements. Proc. of II Int. Conf. on Solid State and Integrated Technology, Int. Acad, Publishers 1989. p. 104105.

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1. Device simulation;III-V Microelectronics;1991

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