Geregeltes Reaktivsputtern von Planar- und Rohrkathoden
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Published:2017-08
Issue:4
Volume:29
Page:46-51
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ISSN:0947-076X
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Container-title:Vakuum in Forschung und Praxis
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language:en
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Short-container-title:Vakuum in Forschung und Praxis
Author:
Radny Tobias1,
Grub Sebastian,
Schäfer Rolf,
Schütte Thomas
Affiliation:
1. robeko GmbH & Co. KG; An der Heide 3b 67678 Mehlingen
Subject
Surfaces, Coatings and Films,Condensed Matter Physics
Reference1 articles.
1. Target voltage behaviour of a vanadiumoxide thin film during reactive magnetron sputtering;Wang;Chin. Phys. B,2011