Characteristics of hydroxyapatite coating on Ti‐6Al‐4V substrate fabricated via sequent H2O2‐oxidizing and RF‐sputtering processes

Abstract

AbstractIn this study, we created a hydroxyapatite (HAp) coating layer on top of the Ti‐6Al‐4V substrate via sequent H2O2‐oxidizing and RF‐sputtering processes and determining the effect of H2O2‐oxidizing state to the adhesion between HAp coating layer and Ti‐6Al‐4V substrate. The results showed that the H2O2‐oxidized Ti‐6Al‐4V surface is rough and porous, which increases the adhesion strength of the HAp coating layer on the alloy substrate. The shear strength value of the HAp/H2O2‐oxidized Ti‐6Al‐4V substrate was 69.3 MPa, significantly higher than that of the HAp/original Ti‐6Al‐4V substrate (12.9 MPa). The X‐ray photoelectron spectroscopy (XPS) proved the denser HAp coating layer covered the TiO2/Ti‐6Al‐4V substrate, consequently effectively prevented releasing of the unwanted toxic elements from the metallic implant.