Author:
Matsuura Toshiaki,Okagaki Satoru,Oshikane Yasushi,Inoue Haruyuki,Nakano Motohiro,Kataoka Toshihiko
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference10 articles.
1. In OSA TOPS on Extreme Ultraviolet Lithography, vol. 4, (eds). Optical Society of America: Washington DC, 1996; 108.
2. Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation
3. Instantaneous phase-shift point-diffraction interferometer
4. , , , . The COE International Symposium on Ultraprecision Science and Technology for Atomistic Production Engineering, Osaka, 2001; 121.
5. Derivation of algorithms for phase-shifting interferometry using the concept of a data-sampling window
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献