Subsurface Engineering Induced Fermi Level De‐pinning in Metal Oxide Semiconductors for Photoelectrochemical Water Splitting-Reference-Cited by-同舟云学术

Subsurface Engineering Induced Fermi Level De‐pinning in Metal Oxide Semiconductors for Photoelectrochemical Water Splitting

Published:2023-01-24 Issue:9 Volume:62 Page:
ISSN:1433-7851
Container-title:Angewandte Chemie International Edition
language:en
Short-container-title:Angew Chem Int Ed

Author:

Wang Jun¹²,Ni Ganghai²,Liao Wanru²,Liu Kang²,Chen Jiawei¹,Liu Fangyang¹,Zhang Zongliang¹,Jia Ming¹,Li Jie¹,Fu Junwei²,Pensa Evangelina³,Jiang Liangxing¹⁴,Bian Zhenfeng⁵,Cortés Emiliano³^ORCID,Liu Min²

Affiliation:

1. School of Metallurgy and Environment Central South University Changsha 410083 Hunan P.R. China

2. Hunan Joint International Research Center for Carbon Dioxide Resource Utilization State Key Laboratory of Powder Metallurgy School of Physics and Electronics Central South University Changsha 410083 Hunan P.R. China

3. Nanoinstitut München Fakultät für Physik Ludwig-Maximilians-Universität München 80539 München Germany

4. Hunan Provincial Key Laboratory of Nonferrous Value-added Metallurgy Changsha 410083 Hunan P.R. China

5. MOE Key Laboratory of Resource Chemistry and Shanghai Key Laboratory of Rare Earth Functional Materials Shanghai Normal University Shanghai 200234 P.R. China

Funder

European Commission

Publisher

Wiley

Subject

General Chemistry,Catalysis

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/anie.202217026

Reference85 articles.

2. Overall water splitting by Ta3N5 nanorod single crystals grown on the edges of KTaO3 particles

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5. A Facet-Dependent Schottky-Junction Electron Shuttle in a BiVO4 {010}-Au-Cu2 O Z-Scheme Photocatalyst for Efficient Charge Separation

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