Use of XPS to follow the evolution of a solution/solid interface: SiMo12O404? acidic solution/GaAs interface-Reference-Cited by-同舟云学术

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Use of XPS to follow the evolution of a solution/solid interface: SiMo12O404? acidic solution/GaAs interface

Published:2002 Issue:1 Volume:34 Page:628-631
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Debiemme-Chouvy Catherine,Quennoy Anne,Etcheberry Arnaud

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference9 articles.

1. Etching of III-V Semiconductors?an Electrochemical Approach. Elsevier Advanced Technology: Oxford, 1991.

2. Reactivity of heteropolyanions toward GaAs compound

3. Heteropoly and Isopoly Oxometalates. Springer Verlag: Heidelberg, 1983.

4. Gradual reduction of molybdosilicates and related compounds

5. Medium Effects on the Redox Properties of 12-Molybdophosphate and 12-Molybdosilicate

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